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Minienvironments for Wafer Cleaning
General Air Corporation is your single source supplier for the process equipment your semiconductor operation needs. We can help you create a walk in style cleanroom complete with wet benches and liquid phase epitaxial reactors or supply you with minienvironments for specific pieces of equipment. We offer a model, the PRD-1000, designed specifically for photo-resist and wafer cleaning operations. It employs the desiccant dehumidification method and allows you to control the temperature as well as humidity. The unit also provides Class 10 or better cleanliness. General Air Corporation can also customize your PRD-1000 for the equipment and access you need. Custom Wet Benches and Hoods
We also offer laboratory hoods and workstations. Ranging from basic customizable hoods to liquid phase epitaxy stations, we can connect you with the best possible work areas. We favor polypropylene hoods because they are strong, lightweight and wear resistant. Our wet benches are available in sizes ranging from 48 to 120 inches and can be customized for your applications. Our exhausted laminar flow stations are extremely popular. They will meet or exceed Class 100 and Federal Standard No. 209 requirements and feature easily changed throw away filters. You can work with our experts to create the worktop best suited for your needs and equipment. Liquid Phase Epitaxy WorkstationsRounding out our workstations is our liquid phase epitaxial reactor. Available in varying sizes to fit into any facility, our liquid phase epitaxy (LPE) workstations give you the control you need to guarantee successful operations. We have designed these units to feature varying degrees of automation and an incredibly low leak rate. They will help you to successfully and safely grow GaAs, InP and other compound epitaxial layers. Whether you need equipment for wafer cleaning or a custom LPE reactor, contact us today and allow us to connect you with equipment made to your exacting standards. Learn More: |