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PRD-1000
Mini-Environment
for Photo-Resist
Applications
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Specifically designed for photo-resist
applications in the semiconductor industry, the PRD-1000 Mini-Environment
is commonly used to house photo-resist deposition machines, where temperature
and humidity must be closely controlled. The chamber uses the desiccant
dehumidification method, providing Class 10 or better cleanliness while
allowing temperature and humidity to be set individually within a specified
range. The system is very compact and can be designed to fit into different
facilities, while being able to house a variety of instruments. Convenient
access for system operation and rear utility connection are also provided. |
Specifications
| Temperature
Control |
+/- 0.1°C
at 6" from filter face at a range of 51 to 73°F (10 to 23°C) |
| Humidity Control |
+/- 1% RH at
a range of 35 to 55% RH |
| Cleanliness |
Class 10 or
better |
| Ambient Condition |
65 to 73°F
(18.5 to 23°C) @ 30 to 55% RH |
| Circulating
Air Flow |
1400 cfm @
70 +/- 20 fpm across filter face |
| Alarm |
Audible and
visual at selected set points |
| Make-Up Air |
Adjustable
0 - 10% max. of circulated air |
| Power |
208 - 220 V,
1 ph, 70 amp, 3 ph 50/60 Hz |
| Custom Features |
Access and
other arrangement available upon request. |
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