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The equipment manufactured by the company environmental division application, is mostly used for semiconductor and optoelectronic applications but is also applicable in the pharmaceutical industry. This line of products includes: Wet bench process stations, laminar flow stations, fume hoods, air handlers, minienvironment (mini-environment) systems and environmental enclosures, providing high degree of environmental control, including class 0.1, 1, 10, 100, 1000, and other levels of cleanliness, with high degree of accuracy of temperature control and/or humidity control. In many applications pressure control is also included.
A second line of product manufactured by General Air includes Oxidation furnaces system, (single dual, triple or four stack system) with automatic or manual loading mechanisms, diffusion furnace systems, LPCVD furnaces, LPE reactor systems used in the manufacturing process of producing semiconductor / optoelectronic devices, like GaAs laser-diodes receivers and transmitters for telecommunication applications, and LED components. Related to that type of products the company also produces custom designed gas panels (UHP gas panels) and gas lines for CVD application in the semiconductor and optoelectronic industries.
All system manufactured by General Air Corporation can be customized to meet customer specifications for custom or standard applications. All systems are configured to meet clean room (cleanroom) specific standards and requirement as demanded by the semiconductor and optoelectronic industries and can be designed to meet various US. European, semiconductor association, or other organization codes.
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